Fujifilm Triples Post-CMP Cleaner Capacity at New Oita Building with 7 Billion Yen Investment
On August 21, Fujifilm held a ceremony to mark the opening of a new building at its subsidiary's Oita plant, tripling production capacity for post-CMP cleaning agents. The 7 billion yen, four-storey facility spans about 3,600 square metres and will produce cleaners used after polishing to enhance AI semiconductor performance. The expansion aims to boost sales and ensure a stable supply of these products.
On August 21, Fujifilm held a ceremony in Oita Prefecture to mark the opening of a new building at its subsidiary's semiconductor materials plant. The building, located at Fujifilm Electronic Materials' Oita plant, will primarily produce post-CMP cleaning agents used in the cleaning process after polishing, a material essential for enhancing the performance of AI semiconductors. The expansion lifts the plant's production capacity to roughly three times its previous level, with the goal of increasing sales and ensuring stable supply.
The new building is a four-storey structure above ground with a total floor area of approximately 3,600 square metres. The investment amounts to about 7 billion yen.
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