Shanghai Aishengna Starts Domestic Immersion DUV Lithography Production, Plans Five Units This Year for SMIC
Shanghai Aishengna Electronic Technology Group, a state-backed company, has begun producing domestic immersion deep ultraviolet (DUV) lithography machines. It plans to manufacture about five units this year and 20 next year, delivering them to SMIC, Hua Hong Semiconductor, and ChangXin Memory Technologies. The company, founded in August 2023 with over 7 billion RMB in registered capital, is assembling a team from other Chinese firms. However, its DUV machines still require further testing and lag far behind ASML's models, posing no immediate commercial threat. ASML's stock fell 8.3% on July 27.
A state-owned enterprise in Shanghai has started DUV production and is forming a research and development team by drawing personnel from other Chinese companies such as Shanghai Yuliangsheng Technology. It plans to produce about five units this year and around 20 units next year. Dutch chip equipment maker ASML is banned from exporting its most advanced extreme ultraviolet (EUV) lithography machines to China, making immersion DUV the most advanced lithography equipment currently available to Chinese chip manufacturers.
Shanghai Aishengna Electronic Technology Group was founded in August 2023 with registered capital of over 7 billion RMB. It focuses on the research, development, manufacturing, and sales of specialized semiconductor and electronic equipment. The group is held by two state-owned enterprises: Shanghai Electric Holdings and a subsidiary of Shanghai International Trust. After integrating teams from top Chinese lithography startups, it is leading the DUV production effort.
According to people familiar with the matter, Aishengna's DUV lithography machines still require further testing and lag far behind ASML's models, posing no direct commercial threat. On July 27, ASML's stock fell to its lowest level since early June, slumping as much as 8.3%. Deep ultraviolet lithography uses a 193-nanometer wavelength and carves circuits through multiple exposures, suitable for producing mature chips above 7 nanometers. Extreme ultraviolet lithography uses a 13.5-nanometer wavelength and operates in a vacuum environment using mirrors, primarily used for producing advanced chips of 5 nanometers and below.
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